The FAB A2A: From Atoms to Applications is a technician-led outreach and discovery day at Northumbria University, designed to highlight the advanced capabilities and technical expertise within our Thin Film Deposition (TFD) laboratories. The day will consist of presentations from academic and industrial experts, hands-on engagement activities, and guided facility experience sessions.
These sessions will provide details on how external collaborators can access TF-FAB for proof-of-concept development, support grant applications, and participate in knowledge transfer activities using TFD tools. The day will also include a tour of the Northumbria Material Characterisation Laboratory (NMCL), which houses a wide range of material characterisation facilities.
FAB A2A is designed primarily for technicians from UK universities, especially those working in materials science fields such as thin film deposition and characterisation. The event is funded by UKITSS and will cover travel and overnight accommodation expenses. Lunch and refreshments will be provided throughout the day.
The event will run in collaboration with our partner, Kurt J. Lesker, the supplier of our TF-FAB thin film deposition system. At the heart of the Kurt J. Lesker Company (KJLC) lies a mission that resonates deeply with the academic community: “Enabling Technology for a Better World.” KJLC provides custom-designed vacuum systems and deposition tools engineered to meet the specific needs of academic laboratories, enabling researchers to fabricate high-quality thin films and conduct precise material studies.
KJLC’s Lesker University (LeskerU) offers a suite of over 30 classes on vacuum science and thin film technology, including: Introduction to Vacuum Science, PVD and Thin Film Growth, and Vacuum System Design. This initiative ensures that university teams not only have access to advanced equipment but also the knowledge to use it effectively.
We hope you will be able to join us for this exciting occasion. Please CLICK or SCAN the QR code below to complete the participant registration.
For any further queries, please contact Cecil Cherian Lukose at
